LASER SOURCES

• Excimer lasers (F₂ 157 nm, ArF 193 nm, KrF 248 nm, XeCl 308 nm)
• Q-switched Nd:YAG lasers emitting at the fundamental wavelength (1064 nm) and up to the 5th harmonic (213 nm) with pulses of nanosecond duration and repetition rate of up to 10 Hz
• Narrow bandwidth tunable dye lasers (from blue to red) pumped with the 3rd harmonic of a Nd:YAG laser
• CW CO₂ tunable laser (9-11 μm) up to 20 W
• Systems for generation of tunable UV and vacuum UV coherent radiation 
• Mode-locked Ti:Sapphire laser oscillator (800 nm, 70, 80 MHz)

CHAMBERS

• Pulsed laser ablation and deposition chambers
• Time-of-flight mass spectrometer coupled to an ablation chamber with continuous or pulsed ion extractor and MCP detector

EQUIPMENT FOR DISPERSION AND DETECTION OF LIGHT

• Equipment for light spectral selection and detection: monochromators, photomultipliers and photodiodes.
• Equipment for spectral analysis of laser induced plasma (laser induced breakdown spectroscopy, LIBS) coupled to an Intensified Charge Coupled Device camera (ICCD) with temporal and spectral resolution of 2 ns and 0.2 nm respectively.
• Hybrid Raman-LIF-LIBS system.
• Nonlinear optical microscope.

                              Nd:YAG laser                                                                                        Excimer laser

Mode-locked Ti:Sapphire laser oscillator